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Cr-Si—N涂层具有较高的硬度,良好的耐磨损抗氧化功能。本文采用磁控溅射沉积方法,以偏压为变量,在三种基片上制备Cr—Si—N涂层。本研究采用X射线衍射仪和扫描型电子显微镜表征偏压对Cr—Si-N涂层的结构的影响;采用纳米压痕仪、残余应力仪、摩擦磨损机等测试偏压对Cr-Si-N涂层的性能的影响。XRD结果显示,随着偏压增加,晶粒变小,并且衍射峰逐渐向小角度偏移。SEM结果显示,随着偏压从0增至-50 V,涂层的柱状晶结构趋于致密化。偏压为0 V,硬度是12.4GPa,偏压增至-50 V,硬度增至35.5 GPa,提高了近两倍。偏压对磨损量影响很小,在偏压为-10 V时,磨损率最小。
Cr-Si-N coating has a high hardness, good anti-wear anti-oxidation function. In this paper, magnetron sputtering deposition method, with bias as a variable, prepared on three substrates Cr-Si-N coating. In this study, X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to characterize the effect of bias voltage on the structure of Cr-Si-N coatings. The effects of bias voltage, residual stress meter, N coating the impact of the performance. XRD results show that as the bias voltage increases, the grain size decreases and the diffraction peak gradually shifts to a small angle. The SEM results show that as the bias voltage increases from 0 to -50 V, the columnar crystal structure of the coating tends to densify. The bias voltage is 0 V, the hardness is 12.4 GPa, the bias voltage is increased to -50 V, and the hardness is increased to 35.5 GPa, nearly doubled. The bias voltage has little effect on the amount of wear, with a minimum wear rate at -10 V bias.