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碳基材料,如石墨(高纯和掺杂石墨)、碳化物(如B_4C和SiC)、以及C/C复合材料被公认是最有希望的面对等离子体壁面材料,大多数碳基材料已成功地被世界各种Tokamak装置所采用,其中以高纯石墨使用得最为普遍,然而高纯石墨也有其自身的局限性,如高化学溅射(Chemical Sputtering)、高氚滞留(Tritium Retention)和热解吸(Thermal Desorption)、以及辐射增强的升华效应(Radiation Enhanced Sublimation),由此产生的大量碳杂质进
Carbon-based materials such as graphite (high-purity and doped graphite), carbides (such as B_4C and SiC), and C / C composites are the most promising plasma facing materials. Most carbon- It has been successfully used by various Tokamak devices all over the world. Among them, high purity graphite is the most commonly used. However, high purity graphite has its own limitations, such as high chemical sputtering, high tritium retention and Thermal Desorption, and Radiation Enhanced Sublimation, resulting in a large amount of carbon impurities into