论文部分内容阅读
运用脉冲高能量密度等离子体，在室温下制成立方氮化硼薄膜．沉积薄膜的衬底材料分别选用单晶硅、氯化钠和ＧＣｒ１５轴承钢，用扫描电镜、透射电镜、红外吸收谱仪、扫描Ａｕｇｅｒ微探针等对沉积的薄膜进行了分析与测试，结果表明，氮化硼薄膜的结构及性质强烈地依赖于实验条件．分析表明立方氮化硼晶核的形成与衬底材料关系不大，但晶核的生长则部分地依赖于衬底．
Pulsed high energy density plasma was used to make cubic boron nitride films at room temperature. The deposited films were made of single crystal silicon, sodium chloride and GCr15 bearing steel respectively. The deposited films were analyzed and tested by scanning electron microscopy, transmission electron microscopy, infrared absorption spectroscopy and scanning Auger microprobe. The results showed that , The structure and properties of boron nitride films strongly depend on the experimental conditions. Analysis shows that the formation of cubic boron nitride nuclei has little to do with the substrate material, but the growth of the nuclei depends, in part, on the substrate.