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在制备薄膜中,研究者经常关心的仅是一种特殊薄膜负有终值的性能。这样一来沉积率是次要的。这些性质可以是光学的或电学的,达到这些性质,是通过在沉积处理过程中直接观察比监控质量与其相关值到所需性能更确切。当有关装置往往比较简单的时候,这些方法是不能普遍地应用而其中的一些方法特别需要便于就地测量的制备监控片,若采用这些方法,则监控片必须放在适当的位置,使其经受与正规基片相同入射的蒸汽分子。而且,热的传导和加热方法应该是和其它保证有相同温度的基片一样。(1)光学监控器,光学现象如光吸收、透射、反射及有关干涉效应能用来监控在真空沉积时膜层的增长。必要的设备是比较简
In the preparation of thin films, researchers are often concerned only with the negative properties of a particular film. As a result, the deposition rate is secondary. These properties can be either optical or electrical and achieving these properties is more precise by directly observing the quality and its associated value during the deposition process to the desired properties. These methods are not universally applicable when these devices are often relatively simple and some of these methods require special preparation of monitoring sheets for in-situ measurements. If these methods are used, the monitoring sheet must be placed in position to withstand The same incident with the regular substrate steam molecules. Moreover, the method of heat conduction and heating should be the same as that of other substrates with the same temperature. (1) Optical monitors. Optical phenomena such as light absorption, transmission, reflection, and related interference effects can be used to monitor film growth during vacuum deposition. The necessary equipment is relatively simple