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本文从超大规模集成电路(以下简称超大)的特点和当前离子注入技术的一些具体情况出发,论述一些离子注入技术急需解决和有待解决的问题。
Based on the characteristics of VLSI technology and some specific conditions of current ion implantation technology, this paper discusses some problems that need to be solved urgently and to be solved.