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Heusler Co2FeSi films with a uniaxial magnetic anisotropy and high ferromagnetic resonance frequency fr were deposited by an oblique sputtering technique on Ru underlayers with various thicknesses tRu from 0 nm to 5 nm. It is revealed that the Ru underlayers reduce the grain size of Co2FeSi, dramatically enhance the magnetic anisotropy field HK induced by the inteal stress from 242 Oe (1 Oe=79.5775 A·m-1) to 582 Oe with an increment ratio of 2.4, while a low damping coefficient remains. The result of damping implies that the continuous interface between Ru and Co2FeSi induces a large in-plane anisotropic field without introducing additional exteal damping. As a result, excellent high-frequency soft magnetic properties with fr up to 6.69 GHz are achieved.