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单质铋作为近年来报道的新型光催化材料受到了研究者的广泛关注,本文主要介绍了铋单质的光敏化、半导体光催化及等离子体共振光催化机理。阐述了以沉淀法、溶剂热法、电化学法为代表的铋单质光催化材料的主要制备方法,并探讨了制备方法中表面活性剂、反应温度以及pH对合成铋单质的影响。归纳了铋单质尺寸和形貌对其吸光性能的影响。在此基础上进一步综述了以铋-二氧化钛、铋-铋系氧化物、铋-氧化锌、铋-氮化碳(C_3N_4)为主要代表的铋-半导体复合光催化材料,并归纳了其光催化增强机理,最后阐述了铋单质及其复合光催化材料的发展趋势。
As a new type of photocatalytic material reported in recent years, elemental bismuth has drawn much attention from researchers. This paper mainly introduces the photo-sensitization, semiconductor photocatalytic and plasma-resonance photocatalytic mechanism of elemental bismuth. The main preparation methods of the bismuth elemental photocatalytic materials represented by the precipitation method, the solvothermal method and the electrochemical method are described. The effects of the surfactant, the reaction temperature and the pH on the synthesis of the elemental bismuth are also discussed. Summarized the bismuth elemental size and morphology of its light absorption properties. On this basis, the bismuth-semiconductor composite photocatalysts mainly represented by bismuth-titania, bismuth-bismuth oxide, bismuth-zinc oxide and bismuth-carbon nitride (C_3N_4) are further reviewed and their photocatalytic activities Enhance the mechanism, finally elaborated the bismuth element and its composite photocatalytic material development trend.