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通过对散粒磨粒抛光过程中的运动轨迹的分析与研究，提出以运动参数为控制因子的磨粒运动轨迹的数学模型，为实现计算机控制抛光过程奠定一定的基础
Through the analysis and research of the motion trajectory during the process of the abrasive particle polishing, the mathematical model of the motion trajectory of the abrasive particle with the motion parameter as the control factor is proposed, which lays a foundation for realizing the computer-controlled polishing process