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设计并制备了工作波长为4.48 nm类镍钽软X射线激光用多层膜反射镜。选择C r/C、C r/Sc为多层膜材料对,模拟了多层膜非理想界面对多层膜反射率的影响。采用直流磁控溅射技术在超光滑硅基片上制备了C r/C、C r/Sc多层膜。利用X射线衍射仪测量了多层膜结构,在德国Bessy II同步辐射上测量了多层膜的反射率,C r/C,C r/Sc多层膜峰值反射率分别为7.50%,6.12%。
A multi-layer film reflector with a working wavelength of 4.48 nm for nickel-tantalum soft X-ray laser was designed and prepared. C r / C and C r / Sc are selected as the multilayer material pairs to simulate the influence of the non-ideal multi-layer interface on the reflectivity of multilayer films. C r / C, C r / Sc multilayers were prepared on ultra-smooth silicon substrates by DC magnetron sputtering. The multilayer films were measured by X-ray diffractometer. The reflectivity of multilayer films was measured on Synchrotron Radiation of Bessy II in Germany. The peak reflectivities of C r / C and C r / Sc multilayer films were 7.50%, 6.12% .