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应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底,利用全息干涉技术和离子束技术刻蚀而成。脉宽压缩光栅的衍射效率和抗激光损伤阈值一方面依赖于光栅结构的设计,另一方面很大程度上取决于作为基底的多层膜的设计。给出了以413.1nm作为写入波长,1053nm作为使用波长的多层介质光栅膜的设计,样品在ZZS-800F型真空镀膜机上采用电子束蒸发方式沉积而成,并给出了膜系结构对光学性能影响因素的详细分析,结果表明膜系H3L(H2L)9H0.5L2.03H满足光栅膜的指标。给出了样品光学特性测试,其使用波长处的透射率<0.5%,写入波长处的透射率>90%,测试表明样品满足设计要求且实验结果和理论设计符合得很好。
The pulse width compression grating used in chirped pulse amplification is based on a multi-layer film as a substrate and is etched using holographic interference and ion beam techniques. The diffraction efficiency and the laser damage resistance threshold of a pulse width compressed grating depend on the design of the grating structure on the one hand and on the other hand on the design of the multilayer film as the substrate. The design of multilayer dielectric grating with 413.1nm as the writing wavelength and 1053nm as the working wavelength is given. The samples are deposited on the ZZS-800F vacuum coating machine by electron beam evaporation method. Optical properties of the detailed analysis of the factors, the results show that the membrane system H3L (H2L) 9H0.5L2.03H meet the grating film indicators. The optical properties of the samples were tested. The results show that the samples meet the design requirements and the experimental results are in good agreement with the theoretical ones. The results show that the transmittance of the samples is less than 0.5% at the wavelength and> 90% at the write wavelength.