透明导电薄膜被广泛应用于平板显示,太阳能电池等发光行业。透明导电薄膜厚度的减少将导电薄膜的用途大为拓展,目前该薄膜的制备仍然是研究热点。采用激光分子束外延(LMBE)镀膜系统在1.0×10-5 Pa的高真空下制备了不同厚度、不同氧压下的ZnO单层膜以及ZnO/Au/ZnO三明治结构薄膜,并进行了光谱及电阻率的测试,运用控制变量法得到ZnO和Au的最优膜层厚度。制备出通透性好(可见光透射率80%以上)、电阻率低(6.89×10-4Ω·cm)厚度均匀的透明导电薄膜。 Transparent conductive film is widely used in flat panel displays, solar cells and other light-emitting industries. The reduction of the thickness of the transparent conductive film greatly expands the use of the conductive film. At present, the preparation of the thin film is still a research hotspot. ZnO single layer films and ZnO / Au / ZnO sandwich films with different thicknesses and oxygen pressures were prepared by laser molecular beam epitaxy (LMBE) coating system under high vacuum of 1.0 × 10-5 Pa. Resistivity test, the use of controlled variable method to get the optimal ZnO and Au film thickness. A transparent conductive film with good permeability (visible light transmittance of more than 80%) and low resistivity (6.89 × 10-4Ω · cm) was prepared.