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采用阳极层线性离子源分别解离Ar气与O2气,对玻璃基片表面进行清洗处理,分析离子束清洗前后玻璃表面的变化,以及气体种类与电源电压对玻璃表面改性的影响。结果表明,离子束对玻璃表面产生显著的刻蚀作用,其中O离子束的刻蚀速率小于Ar,且刻蚀速率随电源电压的升高而增大。椭偏测试结果表明,离子束轰击增大了玻璃的Brewster角,并改变了Brewster角附近的椭圆偏振光谱形貌。通过建模分析发现,这是由于离子束使玻璃表面生成光密介质层,使表面折射率增大所致。
Argon gas and O2 gas were dissociated by anode linear ion source respectively. The surface of the glass substrate was cleaned. The changes of glass surface before and after ion beam cleaning and the influence of gas type and power voltage on the glass surface modification were analyzed. The results show that the ion beam has a significant etching effect on the glass surface. The etching rate of O ion beam is less than Ar, and the etching rate increases with the increase of the power voltage. Ellipsoidal test results show that ion beam bombardment increases the Brewster angle of the glass and changes the elliptical polarized spectrum near the Brewster angle. Through modeling analysis, it is found that this is due to the ion beam generating an optically dense medium layer on the glass surface, resulting in an increase in the refractive index of the surface.