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应用同步辐射x射线小角散射法在原位对块体非晶合金Zr55Cu30 Al1 0 Ni5在等温退火过程中的微结构变化进行研究 .实验表明 :在等温退火过程中电子密度涨落反映了晶化之前的结构弛豫过程 ;在一定的退火温度下、随退火时间的增加 ,拓扑短程序弛豫与化学短程序弛豫之间存在一个电子密度均匀化的过程 ;导致这两种弛豫过程转变的退火时间与退火温度有关 ,温度越高 ,所需的退火时间越短
The microstructure changes of bulk amorphous alloy Zr55Cu30Al1 0 Ni5 during isothermal annealing were studied by X-ray small-angle scattering method of synchrotron radiation.The experimental results show that the electron density fluctuation during the isothermal annealing process before the crystallization Structure relaxation process. At a certain annealing temperature, with the increase of annealing time, there exists a process of uniform electron density between the short-range topological relaxation and chemical short-range relaxation; the transition of these two relaxation processes Annealing time and annealing temperature, the higher the temperature, the shorter the annealing time required