论文部分内容阅读
利用红外光谱技术研究了微波电子回旋共振( ECR)等离子体化学气相沉积 ( CVD)法在低温条件下制备的 Si Nx 膜的键结构和氢含量 ,分析了微波功率和后处理条件对膜含氢量的影响及其成因 ,提出适当提高微波功率是降低微波 ECR- CVD低温 Si Nx 膜中氢含量的可能途径。
The structure and hydrogen content of SiNx films prepared by microwave electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD) at low temperature were studied by using infrared spectroscopy. The effects of microwave power and post-treatment conditions on the hydrogen storage It is suggested that increasing the microwave power properly is a possible way to reduce the hydrogen content in the low temperature Si Nx film of microwave ECR-CVD.