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采用磁控溅射的方法制备了高质量的铁镍合金(Fe_(20)Ni_(80))软磁性薄膜,探究了制备过程中溅射条件对Fe_(20)Ni_(80)薄膜质量的影响,包括溅射气压、溅射功率、退火温度和薄膜厚度等。这些条件或改变了溅射时的溅射速率,或改变了溅射出来的粒子的平均自由程,进而影响制备的Fe_(20)Ni_(80)薄膜的性质,包括薄膜晶粒取向、各向异性磁电阻及垂直各向异性等。通过分别改变薄膜制备过程中的工作气压、溅射功率、退火温度及薄膜厚度等,制备了具有高的各向异性磁电阻、低垂直各向异性和很小的矫顽力的Fe_(20)Ni_(80)薄膜,为下一步制备基于Fe_(20)Ni_(80)薄膜的自旋整流器件提供了工艺基础。
High quality ferro-nickel alloy (Fe_ (20) Ni_ (80)) soft magnetic films were prepared by magnetron sputtering and the effects of sputtering conditions on the quality of Fe_ (20) Ni_ (80) films during sputtering were investigated , Including sputtering pressure, sputtering power, annealing temperature and film thickness. These conditions either change the sputtering rate during sputtering or alter the mean free path of the sputtered particles, thereby affecting the properties of the prepared Fe 20 Ni 80 film, including the orientation of the film grain, Heterogeneous magnetic resistance and vertical anisotropy. The Fe_ (20) with high anisotropy magnetoresistance, low vertical anisotropy and small coercive force were prepared by changing the working pressure, the sputtering power, the annealing temperature and the film thickness respectively during the preparation of the film. The Ni_ (80) thin films provide a process basis for the next step of preparing spin-on devices based on Fe_ (20) Ni_ (80) films.