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研究了基本工艺参数对磁控溅射制备无定形氮化碳（ａ－ＣＮｘ）薄膜沉积的影响．实验结果表明：Ｎ２流量的增加提高了膜的沉积速率，同时提高了膜中氮含量．溅射功率的提高增加了沉积速率．偏压对硬质膜的制备是一关键的工艺参数，它不仅使薄膜致密、表面光滑，而且还可以提高膜中的Ｎ含量．
The effects of basic process parameters on the deposition of amorphous carbon nitride (a-CNx) thin films by magnetron sputtering were studied. The experimental results show that the increase of N2 flow increases the film deposition rate and the nitrogen content in the film. The increase of sputtering power increases the deposition rate. Bias pressure on the preparation of the hard film is a key process parameters, it not only makes the film dense, smooth surface, but also can improve the N content in the film.