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MEMS微针在生物领域中的应用日益广泛,为了方便微针刺入皮肤且减少疼痛,要求微针具有足够的强度和锐利的尖端。传统LIGA工艺只能制造出具有高深宽比的垂直侧壁结构。对传统LIGA工艺进行调整,对光刻胶PMMA进行两次曝光,并通过移动光刻胶台改变X射线的光刻方向,使两次X射线曝光方向相垂直,提出移动LIGA工艺,即移动光刻工艺。此外,利用等腰三角形作为掩膜板图案,显影之后得到截面与X射线掩膜板图案相似的三维实心PMMA微针阵列。再利用此PMMA微针阵列作为原始模具,PDMS转模形成PDMS一级模具,电镀镍得到与PMMA微针阵列相似的金属镍微针阵列。
The application of MEMS microneedles in the field of biology is becoming more and more widespread. In order to facilitate penetration of the microneedles into the skin and reduce pain, microneedles are required to have sufficient strength and sharp tips. The traditional LIGA process can only produce vertical sidewall structures with high aspect ratios. The traditional LIGA process is adjusted, the photoresist PMMA is exposed twice, and the lithography direction of the X-ray is changed by moving the photoresist stage so that the two X-ray exposing directions are perpendicular to each other. A moving LIGA process is proposed, that is, moving the light Engraving process. In addition, using an isosceles triangle as a mask pattern, a three-dimensional solid PMMA microneedle array having a cross-section similar to that of the X-ray mask pattern was obtained after development. Then the PMMA microneedle array was used as the original mold, the PDMS mold formed a PDMS first-order mold, and the nickel-plated nickel microneedle array similar to the PMMA microneedle array was electroplated with nickel.