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利用离子镀方法在基体与耐热涂层之间予先沉积一层ＴｉＮ膜层，作为扩散壁障（中间阻挡层），进行了高温阻扩散试验研究，并应用光镜、电镜、Ｘ射线衍射仪及电子探针等手段对试样氧化区域进行了分析。结果表明，有ＴｉＮ中间层试样、其高温抗氧化性明显提高，ＴｉＮ层在一定温度范围内有良好的稳定性和阻扩散作用；在本试验范围内，ＴｉＮ中间层厚度增加阻扩散效果增强。
A TiN film was pre-deposited between the substrate and the heat-resistant coating by ion plating as a diffusion barrier (intermediate barrier). The high-temperature resistance diffusion test was carried out. The microstructure of the TiN film was characterized by light microscopy, electron microscopy, X-ray diffraction Instruments and electronic probes and other means of the sample oxidation zone was analyzed. The results show that TiN intermetallic layer has a high temperature oxidation resistance and the TiN layer has a good stability and resistance to diffusion in a certain temperature range. In the experimental range, the increase of the thickness of the TiN intermediate layer increases the resistance diffusion effect .