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高功率脉冲磁控溅射技术(HPPMS)溅射粒子离化率高,可沉积致密、高性能薄膜,作为一种新技术在国外广泛研究。本文用高功率脉冲非平衡磁控溅射技术(HPPUMS)制备一系列CrN_x薄膜,采用原子力显微镜(AFM)和X射线衍射(XRD)对不同厚度的薄膜表面形貌、微观结构进行了分析,测定了薄膜的厚度和硬度,研究了薄膜的摩擦学性能,并与中频磁控溅射(MFMS)技术制备的CrN_x进行比较。结果表明,使用高功率脉冲非平衡磁控溅射技术(HPPUMS)能制备致密的CrN_x薄膜。薄膜有较好的综合性能,有较高硬度、较高结合强度和低摩擦系数。
High-power pulsed magnetron sputtering (HPPMS) sputtering particles with high ionization rate can be deposited dense, high-performance film, as a new technology widely studied abroad. In this paper, a series of CrN_x films were prepared by HPPUMS. The surface topography and microstructure of films with different thickness were analyzed by atomic force microscopy (AFM) and X-ray diffraction (XRD) The tribological properties of the films were investigated and compared with CrN_x prepared by MFMS. The results show that dense CrN_x thin films can be prepared by high power pulse unbalance magnetron sputtering (HPPUMS). The film has better overall performance, higher hardness, higher bond strength and low coefficient of friction.