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采用多弧离子镀技术,使用T-iA-lZr合金靶和Cr单质靶,在WC-8%CO硬质合金基体上制备了TiAlZrCr/(Ti,Al,Zr,Cr)N多组元梯度膜。分析了梯度膜的成分、结构和微观组织,并研究了梯度膜的显微硬度和膜/基结合力。研究结果表明,该多组元梯度膜为B1-NaCl型的TiN面心立方结构;薄膜的成分是以TiAlZrCr合金为过渡层的(Ti,Al,Zr,Cr)N梯度膜;薄膜的组织致密均匀,是典型的柱状晶结构;沉积偏压为-50～-200V时,梯度膜均可获得比(Ti,Al,Zr,Cr)N单层膜更高的硬度(最高值为HV4000)和膜/基结合力(临界载荷大于200 N)。
The TiAlZrCr / (Ti, Al, Zr, Cr) N multicomponent gradient films were prepared on WC-8% CO cemented carbide substrate by multi-arc ion plating using T-iA-lZr alloy target and Cr single- . The composition, microstructure and microstructure of the gradient film were analyzed. The microhardness and film / substrate adhesion of the gradient film were also studied. The results show that the multi-component gradient film is TiN face-centered cubic structure of B1-NaCl type. The composition of the film is (Ti, Al, Zr, Cr) N gradient film with TiAlZrCr alloy as the transition layer; Uniform and typical columnar crystal structure. When the deposition bias is -50 ~ -200V, the hardness of the gradient film can be higher than the (Ti, Al, Zr, Cr) N monolayer (the highest is HV4000) Film / substrate bond (critical load> 200 N).