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用多弧离子沉积技术制备出(Ti,Al)N薄膜材料,系统研究了薄膜中Al含量对(Ti,Al)N薄的硬度、表面脆性、抗高温氧化性、耐磨性以及热疲劳性的影响.结果表明含22.5~30%Al的薄膜具有最佳的性能.
(Ti, Al) N thin films were prepared by multi-arc ion deposition. The effects of Al content in thin films on the hardness, surface brittleness, high temperature oxidation resistance, wear resistance and thermal fatigue The results show that the film containing 22.5 ~ 30% Al has the best performance.