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胶体晶体模板法制备的反蛋白石(IO)通常为密堆积结构,而非密堆积的IO可以具有更可控的孔道结构及更宽的光子能带隙,具有重要的意义。通过对密堆积的SiO_2 IO进行化学气相沉积(CVD)法填充,制备非密堆积的IO,并以其为模板通过碳的CVD及SiO_2的刻蚀,制备非密堆积碳IO。其结构为通过管道相互连通的空心碳球阵列,其中空心球及管道直径随着SiO_2 CVD沉积层厚度的增大而减小,管道长度随着SiO_2 CVD沉积层厚度的增大而增大,制备方法具有较好的可控性。该材料在染料敏化太阳能电池、传感器和催化等领域具有较好的潜在应用前景。
The inverse opal (IO) prepared by the colloidal crystal template method is usually a densely packed structure, whereas the non-densely packed IO can have a more controlled pore structure and a wider photonic bandgap, which is of great significance. Through close-packed SiO 2 IO chemical vapor deposition (CVD) method to fill, the preparation of non-close-packed IO, and use it as a template by carbon CVD and SiO 2 etching, non-close-packed carbon IO. The structure is a hollow carbon ball array which is communicated with each other through pipes. The diameter of the hollow ball and the pipe decreases with the increase of the thickness of the SiO 2 CVD deposited layer, and the length of the pipe increases with the increase of the thickness of the SiO 2 CVD deposited layer. The method has good controllability. The material has good potential applications in the fields of dye-sensitized solar cells, sensors and catalysis.