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采用电化学腐蚀法制备了不同多孔度的多孔硅(PS),再通过磁控溅射法在该PS衬底上沉积了一定厚度的Fe膜;并对样品进行了X射线衍射的结构分析、扫描隧道显微技术的表面形貌观察和磁光克尔效应的测量.发现在同一Fe膜厚度下,相对于参考样品硅上的Fe膜,多孔硅上Fe膜的矫顽力更大;同时观察到多孔硅基Fe膜随着PS多孔度的增加,矫顽力相应变大;而对于多孔度相同的多孔硅基样品,随着Fe膜厚度的增加矫顽力却逐步减小.得出了多孔硅特有的海绵状疏松结构能有效调节Fe膜矫顽力大小的结论.
Porous silicon (PS) with different porosity was prepared by electrochemical etching. Then, a certain thickness of Fe film was deposited on the PS substrate by magnetron sputtering. The structure of the sample was analyzed by X-ray diffraction. Scanning tunneling microscopy and magneto-optical Kerr effect observation show that at the same Fe film thickness, compared with the reference sample, the Fe film on the porous silicon, Fe film coercivity larger; at the same time It is observed that the coercivity increases with the increase of PS porosity, while the coercivity decreases gradually with the increase of Fe film thickness for porous Si-based samples with the same porosity. The unique sponge-like porous structure of porous silicon can effectively adjust the coercivity of Fe film size conclusion.