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电子工业用ＣＶＤＤ工艺和性质ＣＶＤＤ（化学气相淀积金刚石）是在氢气中渗入甲烷稀薄气体混合物制得的。温度大于７００℃，压力要低于１０１３３ｋＰａ。制得的金刚石为多晶微结构和柱状晶组织．这种工艺是一个在母体芯子上的ＣＶＤ过程。所得产品直径大于１５０ｍｍ。...
The CVDD process for the electronics industry and the nature of CVDD (Chemical Vapor Deposition Diamond) are made by infiltrating a thin methane gas mixture in hydrogen. The temperature is greater than 700°C and the pressure is lower than 10133kPa. The diamonds obtained were polycrystalline microstructures and columnar crystal structures. This process is a CVD process on the parent core. The resulting product has a diameter of more than 150 mm. ...