使用原子力 /摩擦力显微镜在 5 %— 99%的相对湿度范围 ,研究了二氧化硅和二氧化硅基体上十八烷基三甲氧基硅烷自组装膜 (简称OTESAM/SiO2 )表面摩擦力和粘着力随湿度的变化规律 .实验表明OTESAM/SiO2 不仅能明显改善二氧化硅基体表面的摩擦性能 ,而且在 2 0 0nN(接触区Hertz压力约为 0 .8GPa)的载荷条件下表现出良好的抗磨性能 .由于强的亲水性 ,二氧化硅表面的摩擦力随湿度的增大先逐渐增大 ,然后急剧减小 .相反 ,OTESAM /SiO2 由于其良好的斥水性 ,表面的摩擦力在高湿度条件下略有减小 ,它可望成为微型机械和高速磁记录系统中较为理想的边界润滑剂 . The surface friction and adhesion of octadecyltrimethoxysilane self-assembled films (OTESAM / SiO2) on silica and silica substrates were investigated using an atomic force / friction microscope at a relative humidity range of 5% to 99% The results show that OTESAM / SiO2 can not only improve the frictional properties of the silica matrix obviously, but also show good resistance under the load of 200 nN (the contact Hertz pressure is about 0.8GPa) Grinding performance. Due to the strong hydrophilicity, the friction of silica surface increases with the increase of humidity and then decreases sharply. On the contrary, OTESAM / SiO2 has high surface friction due to its good water repellency Humidity conditions slightly reduced, it is expected to become a micro-mechanical and high-speed magnetic recording system, the more ideal boundary lubricant.