光刻集成电路生产过程所用的照明波长推动着形状尺寸的变化，即波长越短，可使成像特征越小。为制作下一代计算机用的集成电路片，光刻系统也、须更深地向短波长、高能紫外光谱区移动。在该波长区，光学系统的设计和制作变得更困难。这种需要要求有更严格的系统设计法，必须仔 The wavelength of the illumination used in the lithography integrated circuit manufacturing process drives changes in shape and size, ie, the shorter the wavelength, the lower the imaging characteristics. To produce the next generation of integrated circuit chips used in computers, the lithography system must also move deeper into the short wavelength, high energy UV region. In this wavelength region, the design and fabrication of optical systems have become more difficult. This need requires a more stringent system design approach, you must Aberdeen