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采用磁控溅射方法 ,在不同溅射气压下制备了 ( 1 1 1 )取向的具有巨磁电阻效应的Ni80 Fe2 0 /Cu金属多层膜 .室温下 ,饱和磁电阻值随着Cu层厚度的增加呈振荡变化 ,在Cu层厚度tCu=1 .0 ,2 .2nm时 ,磁电阻出现 2个峰值 .对应于溅射气压为 0 .2 5Pa的样品 ,磁电阻分别为 1 9.4%和 1 1 .6 % ,溅射气压为 0 .45Pa的样品 ,磁电阻分别为 1 1 .2 %和 1 % .采用同步辐射光源在CuK吸收边能量位置 ( 8.989keV)对不同溅射气压下制备的多层膜样品做了X光小角衍射和漫散射 ,标定了界面粗糙度 ,用DAFS (Diffractionanomalousfine structurescat tering)方法研究了NiFe层和Cu层各自的局域结构 .结果表明 :溅射气压对多层膜界面的粗糙度有明显的影响 ,而多层膜界面的粗糙度对磁电阻亦有明显的影响
(1 1 1) -oriented Ni80Fe2 0 / Cu multilayers with giant magnetoresistance were prepared by magnetron sputtering at different sputtering pressures.At room temperature, the values of saturation magneto resistance varied with the thickness of Cu layer , The peak value of magneto-resistance appears at the Cu layer thickness tCu = 1.0 and 2.2 nm, corresponding to a sample with a sputtering pressure of 0.52 Pa and a magnetoresistance of 1 9.4% and 1 respectively 1 .6%, sputtering pressure of 0.45Pa samples, respectively, the magnetic resistance of 11.2% and 1%. Using a synchrotron radiation source in CuK absorption edge energy position (8.989keV) prepared under different sputtering pressures The small-angle X-ray diffraction and diffuse scattering of multi-layer samples were done to calibrate the interface roughness and the local structures of NiFe layer and Cu layer were studied by DAFS method. The results showed that the sputtering gas pressure on the multi-layer The roughness of the film interface has a significant impact, and the roughness of the multi-layer interface has a significant impact on the magnetic resistance