论文部分内容阅读
使用脉冲三波长Nd：YAG激光实现了室温下半导体硅上化学沉积Ni-Pd-P纳米膜。SEM结果表明，激光诱导化学沉积Ni-Pd－P纳米膜具有良好的选择性。经STM测试发现，由于激光作用，镀层不仅沿表面生长，而且在厚度方向上也不断增厚。极化曲线测试表明，短时间激光诱导沉积的Ni-Pd-P纳米膜具有优异的析氢催化性能。
The use of pulsed three-wavelength Nd: YAG laser to achieve chemical deposition of Ni-Pd-P nanostructures on semiconductor silicon at room temperature. SEM results show that laser-induced electroless deposition of Ni-Pd-P nanofilm has good selectivity. The STM test found that, due to laser action, the coating not only along the surface growth, but also in the thickness direction of the continuously thickening. Polarization curve tests showed that Ni-Pd-P nano-film deposited by short-time laser has excellent catalytic performance for hydrogen evolution.