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采用射频磁控溅射方法制备单层TaN,NbN和TiN薄膜和不同调制周期的TaN/TiN和NbN/TiN纳米多层膜.薄膜采用X射线衍射仪、高分辨率透射电子显微镜和显微硬度仪进行表征.结果表明TaN/TiN和NbN/TiN纳米多层膜在一定的调制周期范围内均呈共格界面,相应地均出现了超硬效应,且最大硬度值接近.分析了TaN/TiN与NbN/TiN纳米多层膜的超硬机理,TaN/TiN的晶格错配度与NbN/TiN的接近,但TaN/TiN的弹性模量差与NbN/TiN的有一定的差别,表明由于晶格错配使共格外延生长在界面处产生的交变应力场是发生超硬效应的主要因素.
Single-layer TaN, NbN and TiN films and TaN / TiN and NbN / TiN nano-multilayer films with different modulation periods were prepared by RF magnetron sputtering.The films were characterized by X-ray diffraction, high resolution transmission electron microscopy and microhardness The results show that the TaN / TiN and NbN / TiN nanocomposite films have a coherent interface within a certain modulation period, and the superhard effect appears correspondingly, and the maximum hardness values are close. And NbN / TiN nano-multilayers, the lattice mismatch of TaN / TiN is close to that of NbN / TiN. However, the difference of elastic modulus between TaN / TiN and NbN / TiN shows a certain difference. Lattice mismatch so that the coexistence of epitaxial growth at the interface produced alternating stress field is the occurrence of super-hard effect of the main factors.