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在受等离子辐照过的一些有机和无机的基板上,获得了高质量的液晶共面取向。与已知的用来改善顶部锚定及预倾角各向同性的等离子处理方法不同,新方法是将等离子束调整到倾斜射向待取向的基板。在所用的辐射参数范围内,所有基板上的LC取向的易取向轴(easyaxis)都平行于等离子体传播方向。研究了LC的预倾角和锚定能与等离子束的入射角、辐照时间、能量以及辐照电流密度等的依赖关系。经等离子处理过的基板上,方位角、锚定能与用光取向方法得到的相近,而预倾角与摩擦产生的类似。透过率-电压曲线与等离子处理的和摩擦工艺处理的非常接近。与摩擦取向相同,等离子诱导的取向具有很高的温度和光照的稳定性。也考虑了采用等离子/偏振紫外光和等离子/摩擦处理等组合方法来制作LC图形。
On some organic and inorganic substrates irradiated by plasma, high quality liquid crystal coplanar orientation is obtained. In contrast to the known plasma processing methods used to improve the top anchorage and pre-tilt isotropy, the new approach is to adjust the plasma beam to tilt obliquely toward the substrate to be oriented. Within the radiation parameters used, the easy orientation of the LC orientation on all the substrates is parallel to the plasma propagation direction. The dependence of pretilt angle and anchoring energy of LC on the incident angle of plasma beam, irradiation time, energy and irradiation current density was studied. On plasma-treated substrates, the azimuthal and anchoring energies are similar to those obtained by the photo-alignment method, whereas the pretilt angle is similar to that produced by the rubbing. The transmittance-voltage curve is very close to the plasma-treated and rub-off processes. As with the rubbing orientation, the plasma-induced orientation has a very high temperature and light stability. Consideration has also been given to making LC patterns using a combination of plasma / polarized UV light and plasma / rubbing treatments.