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采用磁控溅射方法在硬质合金表面沉积TiAlN硬质薄膜,并在400～850℃的温度下进行氧化处理,通过XPS分析氧化后薄膜表面层的物质组成及变化。结果表明:氧化后的薄膜表面层存在AlN,TiN,Al2O3,TiO2和N—O;随着氧化温度的升高,氧元素和铝元素增加,氮元素和钛元素减少,最终在薄膜表面形成一层耐高温的Al2O3保护层。
The TiAlN hard films were deposited on the cemented carbide by magnetron sputtering and oxidized at 400 ~ 850 ℃. The composition and the change of the oxide film surface were analyzed by XPS. The results showed that AlN, TiN, Al 2 O 3, TiO 2 and N-O were present on the surface of the oxidized film. With the increase of the oxidation temperature, the contents of oxygen and aluminum increased, while the contents of nitrogen and titanium decreased. Layer of high temperature Al2O3 protective layer.