利用光电显微镜瞄准精密刻线,已有了相当长的历史。在现代化生产中,如集成电路生产中,在半导体基片上依次重叠数种摄影掩模,几何图形相互尺寸的误差要求在1～2微米左右,这就要求高精度的几何形状位置检测器,而且这种测量必须在生产过程中在极短的时间内完成。因此,研制各种非接触式光电自动检测器,成了迫切的任务。利用光电方法进行位置的自动检测,可以消除 Aiming at the precision reticle with a light microscope has a long history. In modern production, such as integrated circuit manufacturing, sequential overlapping of several photographic masks on a semiconductor substrate requires geometric errors of about 1 to 2 microns in size, which requires highly accurate geometrical position detectors, and This measurement must be completed in a very short period of time in the production process. Therefore, the development of a variety of non-contact photoelectric automatic detector, has become an urgent task. The use of optical methods for automatic position detection, can be eliminated