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采用粉末靶射频磁控溅射方法制备非晶Al_2O_3薄膜,分析了溅射工艺参数对Al_2O_3薄膜微观结构、表面形貌、光学性能的影响规律及机理,并探究其抗菌特性.研究结果表明:增加氧通量、降低溅射功率和缩短溅射时间均会减小非晶Al_2O_3薄膜颗粒度与粗糙度,同时也降低薄膜的沉积速率;并且,氧通量的增加和溅射时间的缩短均会使非晶Al_2O_3薄膜禁带宽度变宽(最大值可达4.21 e V)、透光率增大(超过90%);光照条件下非晶Al_2O_3薄膜24 h抗菌率最高可达98.6%,体现出了较好的光催化抗菌性.
The amorphous Al_2O_3 thin films were prepared by RF target magnetron sputtering and the influence law and mechanism of the sputtering parameters on the microstructure, surface morphology and optical properties of Al_2O_3 thin films were analyzed. The results showed that: The oxygen flux, the reduction of sputtering power and the shortening of the sputtering time all reduce the grain size and roughness of the amorphous Al 2 O 3 thin films and also decrease the deposition rate of the films. Moreover, both the increase of the oxygen flux and the shortening of the sputtering time The results showed that the band gap of amorphous Al 2 O 3 thin film was widened (up to 4.21 e V) and the transmittance increased (more than 90%). The highest antibacterial rate of amorphous Al 2 O 3 thin film reached 98.6% A better photocatalytic antibacterial.