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在含戊唑醇的马铃薯葡萄糖琼脂(PDA)培养基上,通过紫外线诱导获得了9株对戊唑醇具有不同抗性水平的苹果轮纹病菌Botryosphaeria berengriana f.sp.piricola抗药性突变体,其抗性指数在11.00～67.88之间。将该抗药性突变体继代培养9代后,大多数突变体的抗性指数逐渐下降,但其中有2株抗药性突变体(UV-TS1-f和UV-TS1-10)仍保持较高的抗性水平;抗药性突变体的致病力与敏感菌株相比未发生明显变化;与敏感菌株一样,抗药性突变体适宜生长的温度也为25～28℃,pH值为7～8;在含不同碳、氮源的培养基中,抗药性突变体的菌丝生长与菌丝干重与敏感菌株相比差异明显。研究表明,苹果轮纹病菌在药剂选择压下易形成抗戊唑醇群体,具有中等或高抗药性风险。
Nine mutants of Botryosphaeria berengriana f.sp.piricola resistant to tebuconazole with different levels of tebuconazole were obtained on the PDA medium containing tebuconazole by ultraviolet light. Resistance index between 11.00 ~ 67.88. The resistance index of most of the mutants gradually decreased after subculture of the drug-resistant mutant for 9 generations, but two of the drug-resistant mutants (UV-TS1-f and UV-TS1-10) remained high The resistance of the resistant mutant did not change significantly compared with that of the susceptible strain. As with the susceptible strain, the resistant mutant was suitable for growth at the temperature of 25-28 ℃ and the pH value of 7-8. In medium containing different carbon and nitrogen sources, the mycelial growth and the dry weight of the mycelium of the resistant mutants were significantly different from those of the sensitive strains. Studies have shown that apple ring rot bacteria easy to choose anti-tebuconazole group in drug selection pressure, with medium or high drug resistance risk.