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本文介绍了一台自行研制的离子束表面处理装置。该装置能独立进行离子束溅射沉积金属膜，也能与离子注入机联机进行离子注入和离子束动态混合对材料表面作改性处理。同时介绍了用离子束溅射、离子注入和离子束动态混合技术进行Ｎｉ沉积于Ｓｉ、ＰＥＮ—２．６膜电导性及混合Ｃｒ于 Ｃｒ４Ｍｏ４Ｖ钢的实验结果。
This article describes a self-developed ion beam surface treatment device. The device can independently perform ion beam sputtering deposition metal film, but also with the ion implanter on-line ion implantation and ion beam dynamic mixing material surface modification. At the same time, the experimental results of Ni deposition on Si, PEN-2.6 film conductivity and mixed Cr in Cr4Mo4V steel by ion beam sputtering, ion implantation and ion beam dynamic mixing technology are introduced.