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本文介绍了利用电子束成象在硅衬底上的薄二氧化硅膜中制作图形的一种新方法。所得的电子象,利用聚脂型反应媒介物并通过氢氟酸汽相腐蚀,不仅可以在二氧化硅膜上形成正图形,而且可以形成负图形。
This paper presents a new method of patterning in thin silicon dioxide films on silicon substrates by electron beam imaging. The resulting electron image, using a polyester-type reaction medium and corroded by hydrofluoric acid, not only forms a positive pattern on the silicon dioxide film but also forms a negative pattern.