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目前,有关微量钽分析方法报道较多的是光度法,在光度分析中,由于铌、钽的化学性质十分相似,当铌、钽共存时,它们之间的相互干扰是不可避免的。尽管一些新的方法可以在较多量铌存在下测定钽,但对于铌基合金中微量钽仍不适用。 ICP-AES法测定钽已有报道,但在测定铌基合金中微量钽时,大量铌的干扰使测定无法进行。沈志洪等提出在氟氢酸铵-硫酸介质中,用氯化四苯砷做沉淀剂以(C_6H_5)_4AsTaF_6形式沉淀钽,然后沉淀经分解转化为Ta_2O_5,用重量法测定高温合金中钽,该方法手续繁琐且只能测定较高含量钽。本文采用上述方法分离铌基合金中微量钽,再用ICP-AES法测定获得成功。方法中试验了铌对钽的干扰量、络
At present, there are many reports about the trace tantalum analysis method which is photometric. In the photometric analysis, because the chemical properties of niobium and tantalum are very similar, when niobium and tantalum coexist, the mutual interference between them is unavoidable. Although some new methods allow the determination of tantalum in the presence of relatively large amounts of niobium, it is still not suitable for trace amounts of tantalum in niobium-based alloys. Tantalum has been reported for the ICP-AES method, but large amounts of niobium interfere with the determination of trace tantalum in niobium-based alloys. Shen Zhihong and other proposed in ammonium hydrogen fluoride - sulfuric acid medium, the use of tetraphenyl arsenic as precipitating agent (C_6H_5) _4AsTaF_6 precipitation of tantalum, and then the precipitate was decomposed into Ta_2O_5 gravimetric method for the determination of tantalum alloy, the method Procedures complicated and can only determine the higher levels of tantalum. In this paper, the method described above was used to separate the trace tantalum from niobium-based alloys and the results were determined by ICP-AES. In the method, the amount of niobium and tantalum interference was tested