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现代科学技术,特别是半导体、原子能技术的发展,对金属材料等的纯度的要求愈来愈高,对这些高纯度材料中的杂质的测定,光谱分析乃是主要方法之一。但是要想满足这种越来越高的要求,光谱分析工作者的首要任务就是寻求各种有效的途径来不断的提高分析的灵敏度和准确度。近十余年来国际上在解决提高灵敏度和准确度的问题上进行了不少的工作,同时也获得了若干明显的成就。但是到目前为止。可以说还未能充分地发挥出光谱分析方法所固有的潜力。
Modern science and technology, especially the development of semiconductors and atomic energy technologies, have increasingly high requirements on the purity of metal materials and the like. Spectrometry is one of the major methods for the determination of impurities in these high-purity materials. However, to meet this ever-increasing demand, the primary task of spectral analysts is to find effective ways to continually improve the sensitivity and accuracy of the analysis. In the past decade or so, there have been many international efforts to solve the problems of improving sensitivity and accuracy, and some remarkable achievements have been made. But so far. It can be said that the potential inherent in spectroscopic methods has not yet been fully demonstrated.