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研制了直流电弧等离子体球化U3 Si2 粉体装置。在Ar +He气氛下对粒度为 1 0～ 1 5 0 μm范围内不规则形状的U3 Si2 粉体进行了球化。球化率达 90 %。
The DC arc plasma balling U3 Si2 powder device was developed. In the atmosphere of Ar + He, the irregular shape of U3 Si2 powder with a particle size of 10 ~ 150 μm was spheroidized. Spheroidization rate of 90%.