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笔者设计并实现了高通量多羽流脉冲激光沉积(MPPLD)系统,而且与传统的高通量薄膜材料合成技术进行了比较。目前大多数组合式脉冲激光沉积(PLD)系统为了使沉积的薄膜厚度均匀而采用掩膜法多层薄膜沉积和沉积后退火的工艺,MPPLD则同时利用了多个PLD羽流的方向性和沉积速率的空间变化,在一个衬底上直接沉积不同成分的化合物以形成薄膜材料库。这个新系统更适合以高通量的手段制备多组分化合物薄膜材料。
The author designed and implemented high-throughput multi-plume pulsed laser deposition (MPPLD) system, and compared with the traditional high-throughput thin film material synthesis technology. Most PLD systems utilize mask-based multilayer thin film deposition and post-deposition annealing in order to make the deposited film uniform in thickness. MPPLD also utilizes the directivity and deposition of multiple PLD plumes The spatial variation of velocities directly deposits compounds of different compositions on a single substrate to form a thin film library of materials. This new system is more suitable for high-throughput multi-component compound film materials.