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用磁控溅射法制备Ni_(80)Fe_(20)薄膜,用中温管式炉对NiFe薄膜进行500℃退火处理,用X射线衍射(XRD)仪对退火后的薄膜进行结构分析.运用飞秒激光泵浦-探测技术研究了衬底和退火处理对NiFe薄膜瞬时反射率的影响.实验结果表明:硅片和K9玻璃衬底对20nm厚NiFe薄膜的瞬时反射率曲线影响较小,对40nm和60nm厚NiFe薄膜的瞬时反射率曲线影响较大;经退火处理后的NiFe薄膜的瞬时反射率曲线由小于5ps的时间尺度和大于5ps的时间尺度两部分组成.“,”NiFe films were deposited on Si and K9 glass substrates by magnetron sputtering technique. A part of NiFe films were annealed at 500℃ by CVD reactor. The structural was analyzed by X-ray diffraction (XRD) diffractometer. The influences of substrates and annealing on the transient reflectivity of NiFe films were studied using femtosecond laser pump-probe technology. The results show that the influence of Si and K9 glass substrates on the transient reflectivity curve of 20nm-thick NiFe film is smaller, and the influence of Si and K9 glass substrates on the transient reflectivity curve of 40nm-thick and 60nm-thick NiFe film is greater. The transient reflectivity curves of the annealed NiFe films consist of two parts, one is the timescale 5ps.