金刚石以其卓越的理化性能而受到人们普遍重视。近年来兴起的低压气相合成法,为金刚石在各领域中的更广泛应用提供了光明的前景。但诸多种低压合成法的不足之处在于金刚石的沉积速率还比较低,在某种程度上限制了它的应用范围。直到80年代末,才在日本出现了一种高速沉积金刚石薄膜的方法,就是直流电弧等离子体射流方法,其沉积速率比其它低压法要高几倍到几十倍。 Diamond has received widespread attention due to its excellent physical and chemical properties. The emerging low pressure gas phase synthesis method in recent years has provided a bright prospect for the wider application of diamond in various fields. However, many shortcomings of low-pressure synthesis method is that diamond deposition rate is still relatively low, to a certain extent, limits its scope of application. It was not until the late 1980s that a high-speed method of depositing diamond films appeared in Japan, which was a DC arc plasma jet method. Its deposition rate was several times to several tens times higher than other low pressure methods.