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ZrO2 薄膜样品在不同的沉积温度下用电子束蒸发的方法沉积而成。利用X射线衍射 (XRD)仪和原子力显微镜 (AFM)检测了ZrO2 薄膜的晶体结构和表面形貌 ,发现室温下沉积ZrO2 薄膜样品为非晶结构 ,随着沉积温度升高 ,ZrO2 薄膜出现明显的结晶现象 ,在薄膜中同时存在四方相及单斜相。薄膜表现为自由取向生长 ,晶粒尺寸随沉积温度升高而增大。同时发现薄膜中的残余应力随沉积温度的升高 ,由张应力状态变为压应力状态 ,这一变化主要是薄膜结构变化引起的内应力的作用结果。同时讨论了不同沉积温度对ZrO2 薄膜光学性质的影响。
ZrO2 thin film samples were deposited by electron beam evaporation at different deposition temperatures. The crystal structure and surface morphology of ZrO2 thin films were examined by X-ray diffraction (XRD) and atomic force microscopy (AFM). The ZrO2 thin films deposited at room temperature were amorphous. With the deposition temperature increasing, ZrO2 thin films showed obvious Crystallization phenomenon, there are four phases and monoclinic phase in the film. The film showed free-oriented growth, grain size increases with increasing deposition temperature. At the same time, it is found that the residual stress in the film changes from tensile stress to compressive stress with the increase of deposition temperature. This change is mainly the result of internal stress caused by the change of film structure. The effects of different deposition temperatures on the optical properties of ZrO2 thin films were also discussed.