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利用磁控溅射技术在C103型Nb基高温合金上制备了含和不含CrON扩散阻挡层的NbCrAl涂层,对比研究了2种涂层分别经900℃和1 000℃真空热处理后的元素扩散行为。结果表明:NbCrAl涂层以Cr2Nb和AlNb2相为主,含非晶态组织;真空热处理后生成了NbAl3和(Nb,Cr)沉淀相。热处理温度由900℃升至1 000℃时,NbCrAl涂层中元素扩散速度加快。不含扩散阻挡层样品中Cr和Al元素扩散至基体的含量分别为2.76wt%和1.21wt%,而含扩散阻挡层样品中Cr和Al元素扩散到基体的含量分别仅为2.52wt%和0.84wt%。扩散阻挡层保持连续,且与涂层及基体的界面结合良好,经高温处理后主要以密排六方结构的Cr2O3和Al2O3相为主,有效地抑制了元素互扩散。
The NbCrAl coatings with and without CrON diffusion barriers were prepared on the C103 Nb-base superalloy by magnetron sputtering. The diffusion of the elements after the two coatings were annealed at 900 ℃ and 1 000 ℃ respectively was studied. behavior. The results show that the NbCrAl coatings mainly consist of Cr2Nb and AlNb2 phases with amorphous structure, and NbAl3 and (Nb, Cr) precipitates are formed after vacuum heat treatment. When the heat treatment temperature rose from 900 ℃ to 1000 ℃, the diffusion rate of elements in NbCrAl coating accelerated. The contents of Cr and Al diffused into the matrix in the sample containing no diffusion barrier were 2.76 wt% and 1.21 wt%, respectively, while the contents of Cr and Al diffused to the matrix in the sample containing the diffusion barrier were only 2.52 wt% and 0.84, respectively wt%. The diffusion barrier remained continuous and the interface with the coating and substrate was well bonded. The Cr2O3 and Al2O3 phases were mainly hexagonal close-packed structure after high temperature treatment, which effectively inhibited the mutual diffusion of elements.