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采用W靶、Ti靶及MoS2靶,先制备W-T-iN薄膜,然后再在其上面沉积MoS2纳米薄膜得到W-T-iN/MoS2纳米双层薄膜,通过多次实验得到溅射W-T-iN/MoS2薄膜的最佳工艺如下:溅射气压1.0 Pa,靶基距为100 mm,溅射功率为:W靶,Ti靶均为200W,MoS2靶为150 W;制备W-T-iN薄膜溅射时间为1 h,样品台加热600℃;制备MoS2纳米层时间为0.5 h。使用X射线衍射仪,扫描电子显微镜对薄膜的成分和结构进行分析。采用纳米压痕测试系统测试薄膜的纳米硬度和弹性模量,采用VEECOWYKONT1100非接触光学表面轮廓仪测试薄膜的表面及磨痕粗糙度;UMT-3摩擦磨损试验机在大气、室温、无润滑条件下对薄膜摩擦磨损性能分析,结果表明:在大气环境中,W-T-iN/MoS2薄膜摩擦性能要优于纯W-T-iN薄膜。
WT-iN / MoS2 thin film was prepared by W target, Ti target and MoS2 target first, then the MoS2 nano-thin film was deposited on it to obtain WT-iN / MoS2 nano- The optimum process is as follows: the sputtering pressure is 1.0 Pa, the target distance is 100 mm, the sputtering power is W target, the Ti target is 200W, the MoS2 target is 150 W. The sputtering time of WT-iN thin film is 1 h , Sample stage heated 600 ℃; preparation of MoS2 nano-layer time 0.5 h. The composition and structure of the films were analyzed by X-ray diffractometry and scanning electron microscopy. Nano-indentation test system was used to test the film’s nano-hardness and elastic modulus. VEECOWYKONT1100 non-contact optical profilometer was used to test the surface and wear scar roughness of the film. UMT-3 friction and wear tester was tested under atmospheric, room temperature and without lubrication The friction and wear properties of the films were analyzed. The results show that the tribological properties of WT-iN / MoS2 films are better than that of pure WT-iN films in the atmosphere.