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1.前言大规模集成电路的实现,虽对电气通讯和计算机工业等部门带来影响,但它所可能包含的革命因素已众议纷纭,所抱的期望是极大的。然而,这是指从大规模集成电路的应用方面来说的,若从制造技术来看,也不一定需要与通常的半导体制造工艺在系统方面完全不同的新技术制造工艺。就是说,除了千化工艺,有关应用电子束和X射线作为曝光方法的研究外,主要的均认为是以往半导体制造技术的延续。
1. INTRODUCTION Although the realization of large-scale integrated circuits has had an impact on the departments of telecommunications and the computer industry, the revolutionary factors it may have contained divergent views and great expectations. However, this means that in terms of application of large-scale integrated circuits, it is not absolutely necessary from a manufacturing point of view to have a new system manufacturing process that is totally different from the conventional semiconductor manufacturing process. In other words, apart from the thousands of chemical processes, the application of electron beam and X-ray as the exposure method research, the main are considered the continuation of the semiconductor manufacturing technology in the past.