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本文应用扫描隧道显微镜（ＳＴＭ），对使用等离子体增强化学气相沉积法（ＰＥＣＶＤ）制备的纳米硅（ｎｃ－Ｓｉ：Ｈ）薄膜进行了研究，得到颗粒上以及颗粒间界的原子结构图像，从图像上可以得出：（１）纳米硅薄膜是由许多不同大小的颗粒所组成。这些颗粒同时又是由更小的微颗粒所组成。（２）微颗粒的表面及界面原子排列可以分为四种形式；环状结构，线状结构，网状结构以及完全无规的随机排列。（３）观察到环状结构不仅存在于界面，而且普遍存在于微颗粒的表面。本文从机理上对以上各结构的生成机理进行了初步的讨论。
In this paper, the nanocrystalline silicon (nc-Si: H) thin films prepared by plasma enhanced chemical vapor deposition (PECVD) have been studied by scanning tunneling microscope (STM) to obtain the atomic structural images on the grains and between the grains. Image can be drawn: (1) nano-silicon film is composed of many different size particles. At the same time these particles are composed of smaller particles. (2) The arrangement of atoms and atoms on the surface and interface of microparticles can be divided into four forms; cyclic structure, linear structure, network structure and completely random random arrangement. (3) It is observed that the ring structure exists not only in the interface, but also in the surface of the microparticle. This article from the mechanism of the above structure of the formation of a preliminary discussion.