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Ag_2O薄膜在新型超高存储密度光盘和磁光盘方面具有潜在的应用前景.利用射频磁控反应溅射技术,通过调节衬底温度在沉积气压为0.2 Pa、氧氩比为2:3的条件下制备了一系列Ag_2O薄膜.利用通用振子模型(包括1个Tauc-Lorentz振子和2个Lorentz振子)拟合了薄膜的椭圆偏振光谱.在1.5-3.5 eV能量区间,薄膜的折射率在2.2-2.7之间,消光系数在0.3-0.9之间.在3.5-4.5 eV能量区间,薄膜呈现了明显的反常色散,揭示Ag_2O薄膜的等离子体振荡频率在3.5-4.5 eV之间.随着衬底温度的升高,薄膜的光学吸收边总体上发生了红移,该红移归结于薄膜晶格微观应变随衬底温度的升高而增大.Ag_2O薄膜的光学常数表现出典型的介质材料特性.
Ag_2O thin films have potential applications in new type ultra-high storage density optical disks and magneto-optical disks.Using RF magnetron reactive sputtering technology, by adjusting the substrate temperature at a deposition pressure of 0.2 Pa and oxygen / argon ratio of 2: 3 A series of Ag 2 O thin films were prepared.The elliptical polarization spectra of the films were fitted by using a general oscillator model including one Tauc-Lorentz oscillator and two Lorentz oscillators.In the range of 1.5-3.5 eV, the refractive index of the film was between 2.2-2.7 , Extinction coefficient between 0.3-0.9 between 3.5-4.5 eV energy range, the film showed significant anomalous dispersion, revealing Ag 2 O 2 plasma oscillation frequency between 3.5-4.5 eV with the substrate temperature The red shift is mainly due to the red shift of the optical absorption edge of the film, which is attributed to the increase of the micro-strain of the film lattice with the increase of the substrate temperature.The optical constants of the Ag 2 O films show typical dielectric material properties.