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本文研究了在不同温度的基片上进行磁控溅射 ,氮流量对Fe N薄膜的磁性和结构的影响。实验表明 ,基片温度为 2 0 0℃有助于提高Fe N薄膜的软磁性能。基片为室温和 10 0℃ ,氮流量在 0～ 2sccm范围内变化时 ,未发现γ’ Fe4 N和α″ Fe16N2 ,薄膜中只有N在α Fe中的固溶体。基片温度 2 0 0℃ ,氮流量大于 1.0sccm时 ,薄膜中出现γ′ Fe4 N ,但仍未发现α″ Fe16N2 ,加氮后薄膜的软磁性能明显小于纯铁。当氮流量是 1.0sccm ,温度 2 0 0℃时 ,矫顽力达到最小值 ,Hc =30 6.6A/m。当氮流量是 0 .5sccm ,温度是 2 0 0℃时 ,饱和磁化强度达到 4πMs =2 .3T。
In this paper, the effects of magnetron sputtering and nitrogen flow on the magnetic properties and structure of FeN thin films were investigated. Experiments show that the substrate temperature of 200 ℃ help to improve the soft magnetic properties of Fe N thin films. When the substrate was at room temperature and 100 ℃ and the nitrogen flow rate was changed from 0 to 2sccm, no solid solution of γ ’Fe4N and α “Fe16N2 was found in the film and only N was in αFe. The substrate temperature was 200 ℃, When the flow rate of nitrogen is more than 1.0sccm, γ ’Fe4N appears in the film, but α ”Fe16N2 is still not found. The soft magnetic properties of the film after adding nitrogen are obviously lower than those of pure iron. When the flow rate of nitrogen is 1.0sccm and the temperature is 200 ℃, the coercive force reaches the minimum, Hc = 30 6.6A / m. When the nitrogen flow rate is 0.5sccm and the temperature is 200 ℃, the saturation magnetization reaches 4πMs = 2.3T.