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本文介绍了六氟化钨的性质、应用及目前的发展状况,针对六氟化钨区别于其它电子气体的特殊性质,综述了对其中所含气体杂质和金属粒子的分析方法。六氟化钨中的气体杂质主要包括:四氟化碳、四氟化硅、二氧化碳、六氟化硫、氧气、氮气和一氧化碳,采用加反吹系统的气相色谱法进行分析;氟化氢杂质用傅立叶红外光谱进行分析;六氟化钨中的金属粒子主要有钙、钾、铁、铜和铬等,可以采用原子发射光谱法、原子吸收光谱法和电感耦合等离子质谱法进行测定。
This paper introduces the properties, applications and current development of tungsten hexafluoride. According to the special properties of tungsten hexafluoride distinguished from other electronic gases, the methods for the analysis of gas impurities and metal particles contained therein are reviewed. Gas impurities in tungsten hexafluoride mainly include: carbon tetrafluoride, silicon tetrafluoride, carbon dioxide, sulfur hexafluoride, oxygen, nitrogen and carbon monoxide, gas chromatography using a backflushing system for analysis; hydrogen fluoride impurities with Fourier Infrared spectroscopy. The metal particles in tungsten hexafluoride are mainly calcium, potassium, iron, copper and chromium, which can be determined by atomic emission spectrometry, atomic absorption spectrometry and inductively coupled plasma mass spectrometry.